“The fabrication of three-dimensional (3D) nanostructures is of great interest to many areas of nanotechnology currently challenged by fundamental limitations of conventional lithography. One of the most promising direct-write methods for 3D nanofabrication is focused electron beam-induced deposition (FEBID), owing to its high spatial resolution and versatility. Here we extend FEBID to the growth of complex-shaped 3D nanostructures by combining the layer-by-layer approach of conventional macroscopic 3D printers and the proximity effect correction of electron beam lithography. This framework…”

Read More: https://pubs.acs.org/doi/10.1021/acs.nanolett.9b03565#